Publikationen (23) Publikationen von JOSE ANTONIO VALLES ABARCA

1998

  1. Diffraction gratings in dry developed dichromated gelatin films

    Thin Solid Films, Vol. 317, Núm. 1-2, pp. 343-346

  2. Oxygen ECR stream etching of dichromated gelatin films

    Thin Solid Films, Vol. 317, Núm. 1-2, pp. 340-342

1996

  1. Gallium arsenide etching using ion beams from hydrogen/methane mixtures

    Vacuum, Vol. 47, Núm. 1, pp. 39-44

1994

  1. bombardment angle dependence of reactive ion-beam etching of GaAs with CH4/H2

    Vacuum, Vol. 45, Núm. 10-11, pp. 1113-1114

1992

  1. Temperature dependence of reactive ion beam etching of GaAs with CH4/H2

    Vacuum, Vol. 43, Núm. 5-7, pp. 591-593

1990

  1. Transport processes in plasma assisted deposition of superconducting thin films

    Vacuum, Vol. 41, Núm. 4-6, pp. 867-869

1989

  1. Significance of charge exchange in the determination of yields in broad-beam ion etching

    Vacuum, Vol. 39, Núm. 7-8, pp. 683-685

1987

  1. Energy and momentum transport by sputtered and reflected streams in a glow discharge

    Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 5, Núm. 4, pp. 2217-2221

  2. The influence of pressure on the operation of glow-discharge sputtering systems

    Vacuum, Vol. 37, Núm. 5-6, pp. 391-394

1986

  1. Energy transfer processes in glow discharges

    Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 4, Núm. 3, pp. 1773-1778

  2. SECONDARY EFFECTS IN ION MILLING.

    Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 4, Núm. 1, pp. 322-325

1985

  1. EFFECTS OF SIDE WALL ION REFLECTION ON MASKLESS PHYSICAL ETCHING.

    Vacuum, Vol. 37, Núm. 5-6, pp. 491

  2. Modelling of glow discharge sputtering systems: Theory of the cathode fall region

    Thin Solid Films, Vol. 124, Núm. 1, pp. 59-65

1984

  1. Evolution towards thermalization, and diffusion, of sputtered particle fluxes: Spatial profiles

    Journal of Applied Physics, Vol. 55, Núm. 5, pp. 1370-1378

  2. The contribution of fast neutrals to cathode erosion in glow discharges

    Journal of Physics D: Applied Physics

1983

  1. Energy distributions of particles striking the cathode in a glow discharge

    Physical Review A, Vol. 28, Núm. 6, pp. 3677-3678

  2. Influence of the sputtering gas pressure on deposition profiles

    Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 1, Núm. 3, pp. 1394-1397

  3. Slowing down and thermalization of sputtered particle fluxes: Energy distributions

    Journal of Applied Physics, Vol. 54, Núm. 2, pp. 1071-1075

1982

  1. SIMULATION OF ION-BEAM-ETCHED PATTERN PROFILES - COMMENTS

    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY

1979

  1. Electrode effects in the a.c. characteristics of thin sputtered CdTe films

    Thin Solid Films, Vol. 58, Núm. 1, pp. 67-71