I.U. DE MATERIALES
Institutua
JOSE ANTONIO
VALLES ABARCA
Ikertzailea 1966-2014 tartean
JOSE ANTONIO VALLES ABARCA-rekin lankidetzan egindako argitalpenak (11)
1998
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Diffraction gratings in dry developed dichromated gelatin films
Thin Solid Films, Vol. 317, Núm. 1-2, pp. 343-346
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Oxygen ECR stream etching of dichromated gelatin films
Thin Solid Films, Vol. 317, Núm. 1-2, pp. 340-342
1996
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Gallium arsenide etching using ion beams from hydrogen/methane mixtures
Vacuum, Vol. 47, Núm. 1, pp. 39-44
1994
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bombardment angle dependence of reactive ion-beam etching of GaAs with CH4/H2
Vacuum, Vol. 45, Núm. 10-11, pp. 1113-1114
1992
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Temperature dependence of reactive ion beam etching of GaAs with CH4/H2
Vacuum, Vol. 43, Núm. 5-7, pp. 591-593
1989
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Significance of charge exchange in the determination of yields in broad-beam ion etching
Vacuum, Vol. 39, Núm. 7-8, pp. 683-685
1987
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The influence of pressure on the operation of glow-discharge sputtering systems
Vacuum, Vol. 37, Núm. 5-6, pp. 391-394
1986
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Energy transfer processes in glow discharges
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 4, Núm. 3, pp. 1773-1778
1985
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Modelling of glow discharge sputtering systems: Theory of the cathode fall region
Thin Solid Films, Vol. 124, Núm. 1, pp. 59-65
1984
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The contribution of fast neutrals to cathode erosion in glow discharges
Journal of Physics D: Applied Physics
1983
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Energy distributions of particles striking the cathode in a glow discharge
Physical Review A, Vol. 28, Núm. 6, pp. 3677-3678