bombardment angle dependence of reactive ion-beam etching of GaAs with CH4/H2

  1. Villalvilla, J.
  2. Santos, C.
  3. Vallés-Abarca, J.
Journal:
Vacuum

ISSN: 0042-207X

Year of publication: 1994

Volume: 45

Issue: 10-11

Pages: 1113-1114

Type: Article

DOI: 10.1016/0042-207X(94)90038-8 GOOGLE SCHOLAR
Data source: Scopus