ISABEL
ABRIL SANCHEZ
CATEDRATICO/A DE UNIVERSIDAD
University of Salford
Salford, Reino UnidoPublicaciones en colaboración con investigadores/as de University of Salford (4)
1993
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The effects of model parameter variations on high-fluence ion implantation
Vacuum, Vol. 44, Núm. 8, pp. 783-789
1992
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The effect of parameter choice on predicted depth resolution in sputter profiling
Nuclear Inst. and Methods in Physics Research, B, Vol. 67, Núm. 1-4, pp. 486-490
1986
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DEPTH OF DISORDER GENERATION IN LOW ENERGY Ar** plus ION IMPLANTED Si.
Vacuum, Vol. 36, Núm. 11-12, pp. 1019
1985
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Facet development and its influence on depth resolution during sputtering of Si
Surface and Interface Analysis, Vol. 7, Núm. 1, pp. 41-48