Diffusion and activation of dopants in silicon and advanced silicon-based materials

  1. Pichler, P.
  2. Ortiz, C.J.
  3. Colombeau, B.
  4. Cowern, N.E.B.
  5. Lampin, E.
  6. Uppal, S.
  7. Karunaratne, M.S.A.
  8. Bonar, J.M.
  9. Willoughby, A.F.W.
  10. Claverie, A.
  11. Cristiano, F.
  12. Lerch, W.
  13. Paul, S.
Actes de conférence:
Physica Scripta T

ISSN: 0281-1847

Année de publication: 2006

Volumen: T126

Pages: 89-96

Type: Communication dans un congrès

DOI: 10.1088/0031-8949/2006/T126/021 GOOGLE SCHOLAR