Diffusion and activation of dopants in silicon and advanced silicon-based materials

  1. Pichler, P.
  2. Ortiz, C.J.
  3. Colombeau, B.
  4. Cowern, N.E.B.
  5. Lampin, E.
  6. Uppal, S.
  7. Karunaratne, M.S.A.
  8. Bonar, J.M.
  9. Willoughby, A.F.W.
  10. Claverie, A.
  11. Cristiano, F.
  12. Lerch, W.
  13. Paul, S.
Proceedings:
Physica Scripta T

ISSN: 0281-1847

Year of publication: 2006

Volume: T126

Pages: 89-96

Type: Conference paper

DOI: 10.1088/0031-8949/2006/T126/021 GOOGLE SCHOLAR