Diffusion and activation of dopants in silicon and advanced silicon-based materials

  1. Pichler, P.
  2. Ortiz, C.J.
  3. Colombeau, B.
  4. Cowern, N.E.B.
  5. Lampin, E.
  6. Uppal, S.
  7. Karunaratne, M.S.A.
  8. Bonar, J.M.
  9. Willoughby, A.F.W.
  10. Claverie, A.
  11. Cristiano, F.
  12. Lerch, W.
  13. Paul, S.
Aktak:
Physica Scripta T

ISSN: 0281-1847

Argitalpen urtea: 2006

Alea: T126

Orrialdeak: 89-96

Mota: Biltzar ekarpena

DOI: 10.1088/0031-8949/2006/T126/021 GOOGLE SCHOLAR