Defect diffusion during annealing of low-energy ion-implanted silicon

  1. Bedrossian, P.J.
  2. Caturla, M.-J.
  3. Diaz de la Rubia, T.
Proceedings:
Materials Research Society Symposium - Proceedings

ISSN: 0272-9172

Year of publication: 1996

Volume: 438

Pages: 715-720

Type: Conference paper

DOI: 10.1557/PROC-438-715 GOOGLE SCHOLAR