Monte Carlo simulation of Boron diffusion during low energy implantation and high temperature annealing
- Caturla, M.-J.
- Diaz de la Rubia, T.
- Zhu, J.
- Johnson, M.
Proceedings:
Materials Research Society Symposium - Proceedings
ISSN: 0272-9172
Year of publication: 1997
Volume: 469
Pages: 335-340
Type: Conference paper
