Atomic scale models of ion implantation and dopant diffusion in silicon

  1. Theiss, S.K.
  2. Caturla, M.J.
  3. Johnson, M.D.
  4. Zhu, J.
  5. Lenosky, T.
  6. Sadigh, B.
  7. De La Diaz Rubia, T.
Revue:
Thin Solid Films

ISSN: 0040-6090

Année de publication: 2000

Volumen: 365

Número: 2

Pages: 219-230

Type: Article

DOI: 10.1016/S0040-6090(00)00757-4 GOOGLE SCHOLAR
La source de données: Scopus