Atomic scale models of ion implantation and dopant diffusion in silicon

  1. Theiss, S.K.
  2. Caturla, M.J.
  3. Johnson, M.D.
  4. Zhu, J.
  5. Lenosky, T.
  6. Sadigh, B.
  7. De La Diaz Rubia, T.
Journal:
Thin Solid Films

ISSN: 0040-6090

Year of publication: 2000

Volume: 365

Issue: 2

Pages: 219-230

Type: Article

DOI: 10.1016/S0040-6090(00)00757-4 GOOGLE SCHOLAR
Data source: Scopus