Temperature dependence of reactive ion beam etching of GaAs with CH4/H2

  1. Villalvilla, J.
  2. Santos, C.
  3. Vallés-Abarca, J.
Revue:
Vacuum

ISSN: 0042-207X

Année de publication: 1992

Volumen: 43

Número: 5-7

Pages: 591-593

Type: Article

DOI: 10.1016/0042-207X(92)90083-9 GOOGLE SCHOLAR
La source de données: Scopus