Significance of charge exchange in the determination of yields in broad-beam ion etching

  1. Villalvilla, J.
  2. Santos, C.
  3. Vallés-Abarca, J.
Revue:
Vacuum

ISSN: 0042-207X

Année de publication: 1989

Volumen: 39

Número: 7-8

Pages: 683-685

Type: Article

DOI: 10.1016/0042-207X(89)90016-X GOOGLE SCHOLAR
La source de données: Scopus