Significance of charge exchange in the determination of yields in broad-beam ion etching

  1. Villalvilla, J.
  2. Santos, C.
  3. Vallés-Abarca, J.
Journal:
Vacuum

ISSN: 0042-207X

Year of publication: 1989

Volume: 39

Issue: 7-8

Pages: 683-685

Type: Article

DOI: 10.1016/0042-207X(89)90016-X GOOGLE SCHOLAR
Data source: Scopus