Defect diffusion during annealing of low-energy ion-implanted silicon
- Bedrossian, PJ
- Caturla, MJ
- DelaRubia, TD
- Alexander, DE (coord.)
- Cheung, NW (coord.)
- Park, B (coord.)
- Skorupa, W (coord.)
ISSN: 0272-9172
ISBN: 1-55899-342-8
Année de publication: 1997
Volumen: 438
Pages: 715-720
Congreso: Symposium on Materials Modification and Synthesis by Ion Beam Processing, at the 1996 MRS Fall Meeting
Type: Communication dans un congrès