Defect diffusion during annealing of low-energy ion-implanted silicon
- Bedrossian, PJ
- Caturla, MJ
- DelaRubia, TD
- Alexander, DE (coord.)
- Cheung, NW (coord.)
- Park, B (coord.)
- Skorupa, W (coord.)
ISSN: 0272-9172
ISBN: 1-55899-342-8
Datum der Publikation: 1997
Ausgabe: 438
Seiten: 715-720
Kongress: Symposium on Materials Modification and Synthesis by Ion Beam Processing, at the 1996 MRS Fall Meeting
Art: Konferenz-Beitrag