Increasing the Stability of Isolated and Dense High-Aspect-Ratio Nanopillars Fabricated Using UV-Nanoimprint Lithography

  1. Haslinger, M.J.
  2. Maier, O.S.
  3. Pribyl, M.
  4. Taus, P.
  5. Kopp, S.
  6. Wanzenboeck, H.D.
  7. Hingerl, K.
  8. Muehlberger, M.M.
  9. Guillén, E.
Aldizkaria:
Nanomaterials

ISSN: 2079-4991

Argitalpen urtea: 2023

Alea: 13

Zenbakia: 9

Mota: Artikulua

DOI: 10.3390/NANO13091556 GOOGLE SCHOLAR lock_openSarbide irekia editor