Atomic scale modeling of boron transient diffusion in silicon

  1. Caturla, M.J.
  2. Lilak, A.
  3. Johnson, M.D.
  4. Giles, M.
  5. Diaz de la Rubia, T.
  6. Law, M.
  7. Foad, Mageed
Proceedings:
Proceedings of the International Conference on Ion Implantation Technology

ISBN: 078034538X

Year of publication: 1999

Volume: 2

Pages: 1022-1025

Type: Conference paper