Publicaciones (74) Publicaciones en las que ha participado algún/a investigador/a

1997

  1. "Plastic" lasers: Comparison of gain narrowing with a soluble semiconducting polymer in waveguides and microcavities

    Applied Physics Letters, Vol. 70, Núm. 24, pp. 3191-3193

  2. A Microwave-Powered Thermospray Nebulizer for Liquid Sample Introduction in Inductively Coupled Plasma Atomic Emission Spectrometry

    Analytical Chemistry, Vol. 69, Núm. 17, pp. 3578-3586

  3. Annealing of radiation damage in Si. A molecular dynamics study

    Radiation Effects and Defects in Solids, Vol. 141, Núm. 1-4, pp. 129-140

  4. Behaviour of a desolvation system based on microwave radiation heating for use in inductively coupled plasma atomic emission spectrometry

    Spectrochimica Acta - Part B Atomic Spectroscopy, Vol. 52, Núm. 8, pp. 1201-1213

  5. Bistability of persistent currents in mesoscopic rings

    Journal of Physics Condensed Matter, Vol. 9, Núm. 5, pp. 1095-1103

  6. Characterization of solvent-based polyurethane adhesives containing sepiolite as a filler. rheological, mechanical, surface, and adhesion properties

    Journal of Adhesion Science and Technology, Vol. 11, Núm. 2, pp. 247-262

  7. Comparative study of several nebulizers in inductively coupled plasma atomic emission spectrometry: Low-pressure versus high-pressure nebulization

    Journal of Analytical Atomic Spectrometry, Vol. 12, Núm. 4, pp. 445-451

  8. Comparison of the properties of polyurethane adhesives containing fumed silica or sepiolite as filler

    Journal of Adhesion, Vol. 61, Núm. 1-4, pp. 195-211

  9. Conjugated polymers as solid-state laser materials

    Synthetic Metals, Vol. 91, Núm. 1-3, pp. 35-40

  10. Damage evolution and surface defect segregation in low-energy ion-implanted silicon

    Applied Physics Letters, Vol. 70, Núm. 2, pp. 176-178

  11. Defect diffusion during annealing of low-energy ion-implanted silicon

    Materials Research Society Symposium - Proceedings

  12. Defect diffusion during annealing of low-energy ion-implanted silicon

    MICROSTRUCTURE EVOLUTION DURING IRRADIATION

  13. Defect diffusion during annealing of low-energy ion-implanted silicon

    MATERIALS MODIFICATION AND SYNTHESIS BY ION BEAM PROCESSING

  14. Defect production and annealing kinetics in elemental metals and semiconductors

    Journal of Nuclear Materials, Vol. 251, pp. 13-33

  15. Density functional calculations on Jahn-Teller effect of tetrachloromethane cation

    International Journal of Quantum Chemistry, Vol. 61, Núm. 3, pp. 533-540

  16. Differences between Ab initio and density functional electron densities

    International Journal of Quantum Chemistry, Vol. 61, Núm. 2, pp. 245-252

  17. Dose rate effects during damage accumulation in silicon

    Materials Research Society Symposium - Proceedings

  18. Dose rate effects during damage accumulation in silicon

    MICROSTRUCTURE EVOLUTION DURING IRRADIATION

  19. Electrochemical behaviour of amino acids on Pt(h,k,l). A voltammetric and in situ FTIR study. Part II. Serine and alanine on Pt(111)

    Journal of Electroanalytical Chemistry, Vol. 431, Núm. 2, pp. 269-275

  20. Electrochemical behaviour of amino acids on Pt(h,k,l): A voltammetric and in situ FTIR study. Part 1. Glycine on Pt(111)

    Journal of Electroanalytical Chemistry, Vol. 421, Núm. 1-2, pp. 179-185