Predictive simulation of transient activation processes in boron-doped silicon structures

  1. Lilak, Aaron D.
  2. Law, Mark E.
  3. Jones, Kevin S.
  4. Giles, Martin D.
  5. Andideh, Ebrahim
  6. Caturla, Maria-Jose
  7. Diaz de la Rubia, Tomas
  8. Zhu, Jing
  9. Theiss, Silva
Actes de conférence:
Technical Digest - International Electron Devices Meeting

ISSN: 0163-1918

Année de publication: 1998

Pages: 493-496

Type: Communication dans un congrès