Defect and dopant diffusion in ion implanted silicon: An atomic scale simulation approach
- Caturla, M.-J.
- Theiss, Silva K.
- Lenosky, Thomas J.
- Diaz de la Rubia, T.
Proceedings:
Technical Digest - International Electron Devices Meeting
ISSN: 0163-1918
Year of publication: 1998
Pages: 489-492
Type: Conference paper