Institut
I.U. DE MATERIALES
Publications (72) Publications auxquelles un chercheur a participé
1997
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"Plastic" lasers: Comparison of gain narrowing with a soluble semiconducting polymer in waveguides and microcavities
Applied Physics Letters, Vol. 70, Núm. 24, pp. 3191-3193
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A Microwave-Powered Thermospray Nebulizer for Liquid Sample Introduction in Inductively Coupled Plasma Atomic Emission Spectrometry
Analytical Chemistry, Vol. 69, Núm. 17, pp. 3578-3586
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Annealing of radiation damage in Si. A molecular dynamics study
Radiation Effects and Defects in Solids, Vol. 141, Núm. 1-4, pp. 129-140
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Behaviour of a desolvation system based on microwave radiation heating for use in inductively coupled plasma atomic emission spectrometry
Spectrochimica Acta - Part B Atomic Spectroscopy, Vol. 52, Núm. 8, pp. 1201-1213
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Bistability of persistent currents in mesoscopic rings
Journal of Physics Condensed Matter, Vol. 9, Núm. 5, pp. 1095-1103
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Characterization of solvent-based polyurethane adhesives containing sepiolite as a filler. rheological, mechanical, surface, and adhesion properties
Journal of Adhesion Science and Technology, Vol. 11, Núm. 2, pp. 247-262
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Comparative study of several nebulizers in inductively coupled plasma atomic emission spectrometry: Low-pressure versus high-pressure nebulization
Journal of Analytical Atomic Spectrometry, Vol. 12, Núm. 4, pp. 445-451
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Comparison of the properties of polyurethane adhesives containing fumed silica or sepiolite as filler
Journal of Adhesion, Vol. 61, Núm. 1-4, pp. 195-211
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Conjugated polymers as solid-state laser materials
Synthetic Metals, Vol. 91, Núm. 1-3, pp. 35-40
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Damage evolution and surface defect segregation in low-energy ion-implanted silicon
Applied Physics Letters, Vol. 70, Núm. 2, pp. 176-178
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Defect diffusion during annealing of low-energy ion-implanted silicon
Materials Research Society Symposium - Proceedings
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Defect diffusion during annealing of low-energy ion-implanted silicon
MATERIALS MODIFICATION AND SYNTHESIS BY ION BEAM PROCESSING
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Defect diffusion during annealing of low-energy ion-implanted silicon
MICROSTRUCTURE EVOLUTION DURING IRRADIATION
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Defect production and annealing kinetics in elemental metals and semiconductors
Journal of Nuclear Materials, Vol. 251, pp. 13-33
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Dose rate effects during damage accumulation in silicon
Materials Research Society Symposium - Proceedings
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Dose rate effects during damage accumulation in silicon
MICROSTRUCTURE EVOLUTION DURING IRRADIATION
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Electrochemical behaviour of amino acids on Pt(h,k,l). A voltammetric and in situ FTIR study. Part II. Serine and alanine on Pt(111)
Journal of Electroanalytical Chemistry, Vol. 431, Núm. 2, pp. 269-275
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Electrochemical behaviour of amino acids on Pt(h,k,l): A voltammetric and in situ FTIR study. Part 1. Glycine on Pt(111)
Journal of Electroanalytical Chemistry, Vol. 421, Núm. 1-2, pp. 179-185
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Fabrication and characterization of metallic nanowires
Physical Review B - Condensed Matter and Materials Physics, Vol. 56, Núm. 4, pp. 2154-2160
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Failure analysis of surface-treated unvulcanized SBS rubber/polyurethane adhesive joints
International Journal of Adhesion and Adhesives, Vol. 17, Núm. 2, pp. 133-141